Ultra Clean Processing Of Semiconductor Surfaces Xii
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Ultra Clean Processing of Semiconductor Surfaces XII
Author | : Paul Mertens |
Publisher | : Trans Tech Publications Ltd |
Total Pages | : 350 |
Release | : 2014-09-26 |
Genre | : Technology & Engineering |
ISBN | : 3038266264 |
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Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications, Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications, Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics, Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: Cleaning for 3D Applications, Chapter 9: Contamination Control and AMC, Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells
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