Low Temperature Epitaxial Growth of III-Nitride Semiconductors on Silicon Carbide Templates by Remote Plasma Metal-organic Chemical Vapor Deposition
Language: en
Pages:

Low Temperature Epitaxial Growth of III-Nitride Semiconductors on Silicon Carbide Templates by Remote Plasma Metal-organic Chemical Vapor Deposition

Authors: Robert Dubreuil
Categories:
Type: BOOK - Published: 2017 - Publisher:

GET EBOOK

Group III-Nitride (III-N) semiconductors are of high interest due to their thermal and electrical properties. Opposed to other III-V group semiconductors III-N
Low Temperature Epitaxial Growth of Semiconductors
Language: en
Pages: 356

Low Temperature Epitaxial Growth of Semiconductors

Authors: Takashi Hariu
Categories: Technology & Engineering
Type: BOOK - Published: 1991 - Publisher: World Scientific

GET EBOOK

Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in
Selective Epitaxial Growth of Silicon Carbide on Silicon by Low- Temperature Chemical Vapor Deposition
Language: en
Pages: 242

Selective Epitaxial Growth of Silicon Carbide on Silicon by Low- Temperature Chemical Vapor Deposition

Authors: Ying Gao
Categories:
Type: BOOK - Published: 1997 - Publisher:

GET EBOOK

Epitaxial Growth of Layered Structures of Silicon Carbide and Aluminum Nitride by Metal-organic Chemical Vapor Deposition
Language: en
Pages: 302

Epitaxial Growth of Layered Structures of Silicon Carbide and Aluminum Nitride by Metal-organic Chemical Vapor Deposition

Authors: Bei-Shen Sywe
Categories:
Type: BOOK - Published: 1993 - Publisher:

GET EBOOK

Low Temperature Silicon Epitaxy by Remote, Plasma-enhanced Chemical Vapor Deposition
Language: en
Pages: 306

Low Temperature Silicon Epitaxy by Remote, Plasma-enhanced Chemical Vapor Deposition

Authors: Scott Dwight Habermehl
Categories:
Type: BOOK - Published: 1994 - Publisher:

GET EBOOK