Dry Etching for Microelectronics

Dry Etching for Microelectronics
Author: R.A. Powell
Publisher: Elsevier
Total Pages: 312
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 0080983588


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This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.


Dry Etching for Microelectronics
Language: en
Pages: 312
Authors: R.A. Powell
Categories: Technology & Engineering
Type: BOOK - Published: 2012-12-02 - Publisher: Elsevier

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This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V comp
Dry Etching for Microelectronics
Language: en
Pages: 299
Authors: Ronald A. Powell
Categories: Plasma etching
Type: BOOK - Published: 1984 - Publisher:

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Dry Etching for VLSI
Language: en
Pages: 247
Authors: A.J. van Roosmalen
Categories: Science
Type: BOOK - Published: 2013-06-29 - Publisher: Springer Science & Business Media

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This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each
Dry Etching Technology for Semiconductors
Language: en
Pages: 126
Authors: Kazuo Nojiri
Categories: Technology & Engineering
Type: BOOK - Published: 2014-10-25 - Publisher: Springer

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This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniat
Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control
Language: en
Pages: 452
Authors: G. S. Mathad
Categories: Technology & Engineering
Type: BOOK - Published: 1993 - Publisher: The Electrochemical Society

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