Development And Application Of In Situ Real Time And Ex Situ Characterization Techniques To Study The Growth Of High Temperature Superconducting Htsc Films And Interfaces
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Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces
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Release | : 1997 |
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The objectives of this program are: (1) To demonstrate Time of Flight Ion Scattering and Recoil (ToF-ISARS) Spectroscopy and Spectroscopic Ellipsometry (SE) for in-situ and real time characterization of HTSC thin films and processes. (2) To study HTSC thin film processes and interface reactions.
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