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A special shape of cylinder metal roller is designed for the truly seamless anti-fake product. And it is manufactured by the traditional lithography and electroforming process. However, it is suffered by the complex manufacturing procedure and complicated chemical parameters then the yield rate is not as expected from the original designing concept.In order to overcome the difficulties of the manufacturing procedures, the novel concept of ring shape HDP plasma dry etching of metal roller from semiconductor IC process is proposed and applied to patent.
Design a Ring HDP Semiconductor Plasma Dry Etcher Related Books
A special shape of cylinder metal roller is designed for the truly seamless anti-fake product. And it is manufactured by the traditional lithography and electro
A special shape of cylinder metal roller is designed for the truly seamless anti-fake product. And it is manufactured by the traditional lithography and electro
In order to overcome the difficulties of the manufacturing procedures, the novel concept of slit shape HDP plasma dry etching of metal roller from semiconductor
Unfriendly to conventional electronic devices, circuits, and systems, extreme environments represent a serious challenge to designers and mission architects. Th
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and P
