Characterization of the Chemically Assisted Ion Beam Etching of III-V Semiconductors

Characterization of the Chemically Assisted Ion Beam Etching of III-V Semiconductors
Author: Timothy Jon Dow
Publisher:
Total Pages: 150
Release: 1993
Genre:
ISBN:


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Characterization of the Chemically Assisted Ion Beam Etching of III-V Semiconductors
Language: en
Pages: 150
Authors: Timothy Jon Dow
Categories:
Type: BOOK - Published: 1993 - Publisher:

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Characterization of Reactive Ion Etching of III-V Compound Semiconductor Materials
Language: en
Pages: 260
Authors: Ebrahim Andideh
Categories:
Type: BOOK - Published: 1990 - Publisher:

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Reactive ion etching (RIE) of III-V compound semiconductor materials such as InP, InGaAs, InAlAs, and InGaAsP in methane (CH$sb4$) gas mixtures has been investi
Etching of III-V Semiconductors
Language: en
Pages: 376
Authors: Peter H. L. Notten
Categories: Technology & Engineering
Type: BOOK - Published: 1991 - Publisher: Elsevier Science & Technology

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Handbook of Advanced Plasma Processing Techniques
Language: en
Pages: 664
Authors: R.J. Shul
Categories: Technology & Engineering
Type: BOOK - Published: 2011-06-28 - Publisher: Springer Science & Business Media

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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication.
Topics in Growth and Device Processing of III-V Semiconductors
Language: en
Pages: 568
Authors: S. J. Pearton
Categories: Technology & Engineering
Type: BOOK - Published: 1996 - Publisher: World Scientific

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This book describes advanced epitaxial growth and self-aligned processing techniques for the fabrication of III-V semiconductor devices such as heterojunction b