Characterization Integration And Reliability Of Hfo2 And Laluo3 High Metal Gate Stacks For Cmos Applications
Download and Read Characterization Integration And Reliability Of Hfo2 And Laluo3 High Metal Gate Stacks For Cmos Applications full books in PDF, ePUB, and Kindle. Read online free Characterization Integration And Reliability Of Hfo2 And Laluo3 High Metal Gate Stacks For Cmos Applications ebook anywhere anytime directly on your device. We cannot guarantee that every ebooks is available!
Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications
| Author | : Alexander Nichau |
| Publisher | : Forschungszentrum Jülich |
| Total Pages | : 199 |
| Release | : 2014-04-03 |
| Genre | : |
| ISBN | : 3893368981 |
Download Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications Book in PDF, Epub and Kindle
Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications Related Books
Language: en
Pages: 199
Pages: 199
Type: BOOK - Published: 2014-04-03 - Publisher: Forschungszentrum Jülich
Language: en
Pages:
Pages:
Type: BOOK - Published: 2013 - Publisher:
Language: en
Pages: 0
Pages: 0
Type: BOOK - Published: 2013 - Publisher:
Language: en
Pages: 179
Pages: 179
Type: BOOK - Published: 2013 - Publisher:
Language: en
Pages: 151
Pages: 151
Type: BOOK - Published: 2014 - Publisher: Forschungszentrum Jülich
