Three Dimensional Nanoarchitectures by Atomic Layer Deposition for Energy-related Applications

Three Dimensional Nanoarchitectures by Atomic Layer Deposition for Energy-related Applications
Author: Zhaodong Li
Publisher:
Total Pages: 157
Release: 2016
Genre:
ISBN:


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Atomic layer deposition (ALD) is a cyclic, multi-step thin film chemical vapor deposition process based on sequential self-limiting surface reactions. It has been widely applied for synthesizing various three dimensional (3D) nanoscale morphologies. Recently, based on ALD process, a surface-reaction-limited pulsed chemical vapor deposition (SPCVD) technique was developed for 3D hierarchical branched nanowire (NW) architecture with super high surface area density and good electronic transport properties. This new ALD-based nanomanufacturing technique demonstrated great potential to conduct large-area and low-cost fabrication of high-density 3D nanomaterials for energy harvesting and storage applications, such as photoelectrochemical (PEC) water splitting, solar cells, batteries and supercapacitors. In this dissertation, a series of experimental work is presented regarding fundamental understandings and rational controls of the SPCVD process in branched nanorod (NR) synthesis, as well as the application potentials of 3D branched nanowire architectures. First, the composition control ability of SPCVD was studied on nitrogen-doped TiO2 NRs to overcome the intrinsically visible light absorption constrains of metal oxide semiconductors. Second, to further improve the porosity and surface area while maintain good redox reaction kinetics, several 3D cellulose nanofibers (CNFs) templated fibrous TiO2 nanoarchitectures were synthesized. By integrating the strong capillary property of CNF film, the capillary PEC and capillary photocatalytic systems were developed by performing water redox reactions outside of the body of electrolyte with enhanced reaction kinetics and higher efficiency. At last, SPCVD was applied to the growth of high-density vanadium oxide (VOx) NR branches on Si NW backbones. Such a 3D hierarchical VOx/Si NW structure exhibited enhanced performance as a supercapacitor. These achievements open a new avenue of ALD for large-area, low-cost, and green fabrication of materials, which would be used in solar energy conversion and electrical energy storage.


Three Dimensional Nanoarchitectures by Atomic Layer Deposition for Energy-related Applications
Language: en
Pages: 157
Authors: Zhaodong Li
Categories:
Type: BOOK - Published: 2016 - Publisher:

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Atomic layer deposition (ALD) is a cyclic, multi-step thin film chemical vapor deposition process based on sequential self-limiting surface reactions. It has be
Three-Dimensional Nanoarchitectures
Language: en
Pages: 550
Authors: Weilie Zhou
Categories: Technology & Engineering
Type: BOOK - Published: 2011-08-04 - Publisher: Springer Science & Business Media

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Devices built from three-dimensional nanoarchitectures offer a number of advantages over those based on thin-film technology, such as larger surface area to enh
Atomic Layer Deposition of Nanostructured Materials
Language: en
Pages: 472
Authors: Nicola Pinna
Categories: Technology & Engineering
Type: BOOK - Published: 2012-09-19 - Publisher: John Wiley & Sons

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Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays
Atomic Layer Deposition Functionalization and Modification of Three Dimensional Nanostructures for Energy Storage and Conversion
Language: en
Pages: 0
Authors: Yan Mi
Categories:
Type: BOOK - Published: 2016 - Publisher:

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Um der steigende Nachfrage nach nachhaltigen und erneuerbaren Energiequellen in der Zukunft gerecht zu werden, wurden viele Anstrengen unternommen um hoch effiz
Three-Dimensional Nanoarchitectures
Language: en
Pages: 558
Authors: Weilie Zhou
Categories:
Type: BOOK - Published: 2011-08-31 - Publisher:

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