The Ion-beam Reactive Sputtering Process for Deposition of Niobium Nitride Thin Films

The Ion-beam Reactive Sputtering Process for Deposition of Niobium Nitride Thin Films
Author: Daniel Jenner Lichtenwalner
Publisher:
Total Pages: 658
Release: 1990
Genre:
ISBN:


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The Ion-beam Reactive Sputtering Process for Deposition of Niobium Nitride Thin Films
Language: en
Pages: 658
Authors: Daniel Jenner Lichtenwalner
Categories:
Type: BOOK - Published: 1990 - Publisher:

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Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Processes, Properties and Applications
Language: en
Pages: 363
Authors: Filipe Vaz
Categories: Technology & Engineering
Type: BOOK - Published: 2013-06-21 - Publisher: Bentham Science Publishers

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Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion
Niobium Nitride Based Thin Films Deposited by DC Reactive Magnetron Sputtering
Language: en
Pages: 82
Authors: Moushab Benkahoul
Categories:
Type: BOOK - Published: 2005 - Publisher:

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Handbook of Sputter Deposition Technology
Language: en
Pages: 658
Authors: Kiyotaka Wasa
Categories: Science
Type: BOOK - Published: 2012-11-20 - Publisher: William Andrew

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This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputt
Reactive Sputter Deposition
Language: en
Pages: 584
Authors: Diederik Depla
Categories: Technology & Engineering
Type: BOOK - Published: 2008-06-24 - Publisher: Springer Science & Business Media

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In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detai