Resolution Improvement And Pattern Generator Development For The Maskless Micro Ion Beam Reduction Lithography System
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Resolution Improvement and Pattern Generator Development for the Maskless Micro-ion-beam Reduction Lithography System
| Author | : Ximan Jiang |
| Publisher | : |
| Total Pages | : 184 |
| Release | : 2006 |
| Genre | : |
| ISBN | : 9780542824692 |
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In order to provide an economical lithography approach for low to medium volume advanced IC fabrication, a maskless ion beam lithography method, called Maskless Micro-ion-beam Reduction Lithography (MMRL), has been developed in the Lawrence Berkeley National Laboratory. The development of the prototype MMRL system has been described by Dr. Vinh Van Ngo in his Ph.D. thesis. But the resolution realized on the prototype MMRL system was far from the design expectation.
