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The X-ray source is an important part of any X-ray lithographic system since its characteristics affect ultimate resolution and throughput. High temperature plasmas can be intense X-ray emitters and may be suitable for lithography. This report defines some general considerations which are helpful in evaluating various plasma sources. In addition, a brief analysis is given of three devices, or systems, used to produce such plasmas: the electron beam-sliding spark, the dense plasma focus and the laser produced plasma. (Author).
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