Plasma Etching
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Plasma Etching
| Author | : M. Sugawara |
| Publisher | : OUP Oxford |
| Total Pages | : 362 |
| Release | : 1998-05-28 |
| Genre | : Technology & Engineering |
| ISBN | : 0191590290 |
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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
