Multiscale Modeling Of Chemical Vapor Deposition And Plasma Etching
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Multiscale Modeling of Chemical Vapor Deposition and Plasma Etching
Author | : Seth Thomas Rodgers |
Publisher | : |
Total Pages | : 246 |
Release | : 2000 |
Genre | : |
ISBN | : |
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Multi-scale modeling of chemical vapor deposition (CVD) is a very broad topic because a large number of physical processes affect the quality and speed of film