Lithography Process Control

Lithography Process Control
Author: Harry J. Levinson
Publisher: SPIE Press
Total Pages: 210
Release: 1999
Genre: Photography
ISBN: 9780819430526


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This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.


Lithography Process Control
Language: en
Pages: 210
Authors: Harry J. Levinson
Categories: Photography
Type: BOOK - Published: 1999 - Publisher: SPIE Press

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This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both
Lithography Process Control
Language: en
Pages:
Authors:
Categories:
Type: BOOK - Published: 1996 - Publisher:

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Fundamentals of Semiconductor Manufacturing and Process Control
Language: en
Pages: 428
Authors: Gary S. May
Categories: Technology & Engineering
Type: BOOK - Published: 2006-05-26 - Publisher: John Wiley & Sons

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A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and P
Fundamental Principles of Optical Lithography
Language: en
Pages: 503
Authors: Chris Mack
Categories: Technology & Engineering
Type: BOOK - Published: 2011-08-10 - Publisher: John Wiley & Sons

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The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these p
Run-to-Run Control in Semiconductor Manufacturing
Language: en
Pages: 368
Authors: James Moyne
Categories: Technology & Engineering
Type: BOOK - Published: 2018-10-08 - Publisher: CRC Press

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Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift