Hot Carrier Reliability Characterization of 0.25 Micrometer MOSFETs with Alternative Gate Dielectrics
Language: en
Pages: 276

Hot Carrier Reliability Characterization of 0.25 Micrometer MOSFETs with Alternative Gate Dielectrics

Authors: Celisa Kelly Date
Categories:
Type: BOOK - Published: 1993 - Publisher:

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Evaluation of Device Performance and Hot-carrier Reliability for an N-channel MOSFET Using NO-nitrided Gate Dielectric
Language: en
Pages: 182

Evaluation of Device Performance and Hot-carrier Reliability for an N-channel MOSFET Using NO-nitrided Gate Dielectric

Authors: Allen P. Lo
Categories: Integrated circuits
Type: BOOK - Published: 1999 - Publisher:

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Fundamentals of Bias Temperature Instability in MOS Transistors
Language: en
Pages: 282

Fundamentals of Bias Temperature Instability in MOS Transistors

Authors: Souvik Mahapatra
Categories: Technology & Engineering
Type: BOOK - Published: 2015-08-05 - Publisher: Springer

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This book aims to cover different aspects of Bias Temperature Instability (BTI). BTI remains as an important reliability concern for CMOS transistors and circui
Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications
Language: en
Pages: 199

Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications

Authors: Alexander Nichau
Categories:
Type: BOOK - Published: 2014-04-03 - Publisher: Forschungszentrum Jülich

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Atomic Layer Deposition for Semiconductors
Language: en
Pages: 266

Atomic Layer Deposition for Semiconductors

Authors: Cheol Seong Hwang
Categories: Science
Type: BOOK - Published: 2013-10-18 - Publisher: Springer Science & Business Media

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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, log