Formation Of Low Resistivity Germanosilicide Contacts To Phosporous Doped Silicon Germanium Alloy Source Drain Junctions For Nanoscale Cmos
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Formation of Low-resistivity Germanosilicide Contacts to Phosphorus Doped Silicon-germanium Alloy Source/drain Junctions for Nanoscale CMOS
Author | : Hongxiang Mo |
Publisher | : |
Total Pages | : 131 |
Release | : 2003 |
Genre | : |
ISBN | : |
Download Formation of Low-resistivity Germanosilicide Contacts to Phosphorus Doped Silicon-germanium Alloy Source/drain Junctions for Nanoscale CMOS Book in PDF, Epub and Kindle
Keywords: SiGe, germanosilicide, contact reistance, silicide, silicon germanium, MOSFET, source drain.
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