Formation Of Low Resistivity Germanosilicide Contacts To Phosphorus Doped Silicon Germanium Alloy Source Drain Junctions For Nanoscale Cmos
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Formation of Low-resistivity Germanosilicide Contacts to Phosphorus Doped Silicon-germanium Alloy Source/drain Junctions for Nanoscale CMOS
| Author | : Hongxiang Mo |
| Publisher | : |
| Total Pages | : 131 |
| Release | : 2003 |
| Genre | : |
| ISBN | : |
Download Formation of Low-resistivity Germanosilicide Contacts to Phosphorus Doped Silicon-germanium Alloy Source/drain Junctions for Nanoscale CMOS Book in PDF, Epub and Kindle
Keywords: SiGe, germanosilicide, contact reistance, silicide, silicon germanium, MOSFET, source drain.
