Electron Spin Resonance And Radiation Effects In Mos Devices

The basic mechanisms were explored of radiation damage in metal/ oxide/silicon (MOS) field effect transistors (MOSFET's) with a combination of electron spin resonance (ESR) and electrical measurements. The major focus has been develop a new and much more sensitive ESR technique called spin dependent recombination (SDR) to study radiation damage in MOSFET's. Keywords: Metal oxide semiconductors; Field effect transistors; Electron spin resonance; Radiation effects.