Characterization Integration And Reliability Of Hfo2 And Laluo3 High Metal Gate Stacks For Cmos Applications
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Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications
Author | : Alexander Nichau |
Publisher | : Forschungszentrum Jülich |
Total Pages | : 199 |
Release | : 2014-04-03 |
Genre | : |
ISBN | : 3893368981 |
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